DocumentCode :
169400
Title :
300mm+ factory layout design and innovations for advanced semiconductor manufacturing
Author :
Yih-Jan Huang ; Chia-Yin Kuo ; Ming-Te Kao ; Huang, R. ; Lee, Fred
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear :
2014
fDate :
19-21 May 2014
Firstpage :
98
Lastpage :
102
Abstract :
In conclusion, the study has applied AHP method to compare and to define the weighting of factors in a factory macro layout design. The results pointed out process flow, process time, contamination control rule and safety rule are the critical factors. Thus, from macro layout design stage, layout design team needs to consider process flow and process time by different technology nodes because those have great impact on manufacturing performance [3]. In addition to operation related issue, factory layout design also needs to focus on safety & risk related issue such as defining escape path, tool move-in path or other ergonomics issues.
Keywords :
analytic hierarchy process; ergonomics; integrated circuit layout; semiconductor device manufacture; AHP method; advanced semiconductor manufacturing; contamination control rule; ergonomics; escape path; factory layout design; factory layout innovations; factory macro layout design; process flow; process time; safety rule; tool move-in path; Analytic hierarchy process; Contamination; Layout; Manufacturing; Planning; Production facilities; Safety;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI
Conference_Location :
Saratoga Springs, NY
Type :
conf
DOI :
10.1109/ASMC.2014.6846985
Filename :
6846985
Link To Document :
بازگشت