• DocumentCode
    169466
  • Title

    Investigation of novel inspection capability for 3D NAND device wordline inspection

  • Author

    Soon Kyu Lee ; Seong-Min Ma ; IlSeok Seo ; Hyeon Sang Shin ; Hyeon Soo Kim ; Cross, Allen ; Baris, Oksen ; DoOh Kim ; Seung Hwan Lee ; Lange, Stanislav

  • Author_Institution
    SK hynix Semicond. Inc., Icheon, South Korea
  • fYear
    2014
  • fDate
    19-21 May 2014
  • Firstpage
    278
  • Lastpage
    282
  • Abstract
    Migration to a 3D implementation for NAND flash devices is seen as the leading contender to replace traditional planar architectures. The new 3D NAND architectures involve the stacking of multiple cells formed inside a high aspect ratio channel hole. However, the strategy of replacing shrinking design rules for greater aspect ratios is not without its own set of challenges, especially related to defectivity. Process integration of the wordline is a particular challenge, both for integrators as well as for defect inspection and reduction. Key defects of interest are typically sub-surface (especially voids), buried in the stack, or are residues in high aspect ratio structures. In our collaboration we investigated the performance of both current optical inspection systems as well as the value of new inspection techniques identified using simulations for buried defect detection. This simulation investigation showed the potential value of near infrared wavelengths. A prototype inspection tool was investigated which lead to the development of near infrared optimized optics for a production capable inspection tool. This study validates this capability in R&D and is now being implemented as a production monitoring solution.
  • Keywords
    NAND circuits; flash memories; inspection; logic design; 3D NAND device wordline inspection; NAND flash devices; defect inspection; inspection capability; multiple cells stacking; prototype inspection tool; Flash memories; Inspection; Logic gates; Mathematical model; Production; Prototypes; Three-dimensional displays; 3DNAND; Defect inspection; Defect simulation; VNAND;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • Type

    conf

  • DOI
    10.1109/ASMC.2014.6847021
  • Filename
    6847021