DocumentCode
169466
Title
Investigation of novel inspection capability for 3D NAND device wordline inspection
Author
Soon Kyu Lee ; Seong-Min Ma ; IlSeok Seo ; Hyeon Sang Shin ; Hyeon Soo Kim ; Cross, Allen ; Baris, Oksen ; DoOh Kim ; Seung Hwan Lee ; Lange, Stanislav
Author_Institution
SK hynix Semicond. Inc., Icheon, South Korea
fYear
2014
fDate
19-21 May 2014
Firstpage
278
Lastpage
282
Abstract
Migration to a 3D implementation for NAND flash devices is seen as the leading contender to replace traditional planar architectures. The new 3D NAND architectures involve the stacking of multiple cells formed inside a high aspect ratio channel hole. However, the strategy of replacing shrinking design rules for greater aspect ratios is not without its own set of challenges, especially related to defectivity. Process integration of the wordline is a particular challenge, both for integrators as well as for defect inspection and reduction. Key defects of interest are typically sub-surface (especially voids), buried in the stack, or are residues in high aspect ratio structures. In our collaboration we investigated the performance of both current optical inspection systems as well as the value of new inspection techniques identified using simulations for buried defect detection. This simulation investigation showed the potential value of near infrared wavelengths. A prototype inspection tool was investigated which lead to the development of near infrared optimized optics for a production capable inspection tool. This study validates this capability in R&D and is now being implemented as a production monitoring solution.
Keywords
NAND circuits; flash memories; inspection; logic design; 3D NAND device wordline inspection; NAND flash devices; defect inspection; inspection capability; multiple cells stacking; prototype inspection tool; Flash memories; Inspection; Logic gates; Mathematical model; Production; Prototypes; Three-dimensional displays; 3DNAND; Defect inspection; Defect simulation; VNAND;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI
Conference_Location
Saratoga Springs, NY
Type
conf
DOI
10.1109/ASMC.2014.6847021
Filename
6847021
Link To Document