DocumentCode

1695684

Title

Correlating Plasma Emissivity And Etch Depth*

Author

Buie, M.J. ; Pender, J.T. ; Spindler, H.L. ; Soniker, J. ; Brake, M.L. ; Elta, M.

Author_Institution

University of Michigan

fYear

1994

Firstpage

215

Lastpage

215

Keywords

Argon; Electrodes; Electrons; Etching; Inductors; Optical imaging; Optical recording; Plasma applications; Plasma materials processing; Plasma properties;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on

Conference_Location

Santa Fe, NM, USA

ISSN

0730-9244

Print_ISBN

0-7803-2006-9

Type

conf

DOI

10.1109/PLASMA.1994.589121

Filename

589121