DocumentCode
1696096
Title
Significant reduction of wire sweep using Ni plating to realise ultra fine pitch wire bonding
Author
Terashima, Shinichi ; Yamamoto, Yukihiro ; Uno, Tomohiro ; Tatsumi, Kohei
Author_Institution
Adv. Technol. Res. Labs., Nippon Steel Corp., Chiba, Japan
fYear
2002
fDate
6/24/1905 12:00:00 AM
Firstpage
891
Lastpage
896
Abstract
Significant reduction of the wire sweep in molding is proposed because the wire sweep is considered to be the major problem to realise wire bonding with ultra fine pitches of under 30 micrometers. In the present proposal, Ni was plated for several micrometers before molding on bonded Au wires. Ni plating was carried out by means of electroless plating for several minutes in the aqueous solution kept at 358 K containing Ni and P. The wire sweep ratio for Ni plated wire (total diameter was 21 micrometers) was almost half of that for Au wire with the diameter of 15 micrometers except Ni plate, and was slightly smaller than that for Au wire with the diameter of 25 micrometers except Ni plate even the total diameter was smaller. It is considered that wire sweep suppression by this technique was due to the enhancement of both elastic and plastic properties.
Keywords
Young´s modulus; electroplated coatings; gold; integrated circuit interconnections; integrated circuit packaging; integrated circuit testing; lead bonding; moulding; nickel; plasticity; 15 micron; 21 micron; 25 micron; 358 K; Au; Au bonded wires; Molding; Ni; Ni plated wire; Ni plating; aqueous solution; diameter 15 μm; diameter 21 μm; diameter 25 μm; elastic properties; electroless plating; plastic properties; temperature 358 K; ultra fine pitches; wire bonding; wire sweep; Bonding; Coatings; Electronics packaging; Gold; Laboratories; Plastics; Proposals; Resins; Steel; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2002. Proceedings. 52nd
ISSN
0569-5503
Print_ISBN
0-7803-7430-4
Type
conf
DOI
10.1109/ECTC.2002.1008205
Filename
1008205
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