DocumentCode :
1696123
Title :
Development of the vacuum power flow channel for the Mini-G
Author :
Javedani, J.B. ; Goerz, Dave A. ; Reisman, D.B. ; Houck, T.L. ; Perkins, Michael P. ; Richardson, R.A. ; Vogtlin, G.E.
Author_Institution :
Lawrence Livermore Nat. Lab., Livermore, CA, USA
fYear :
2012
Firstpage :
1
Lastpage :
9
Abstract :
The Mini-G explosive pulsed power system is a two-stage helical-coaxial FCG that is geometrically a half-scale version of LLNL´s FFT device. The generator is capable of delivering 60 MA currents and 10 MJ of energy to suitable inductive loads. The Mini-G is presently used in high-energy-density physics experiments that require efficient current delivery through a vacuum power flow region to the load. As with the FFT device, the Mini-G system requires a compact, high-voltage gas-to-vacuum insulator and low-inductance vacuum power flow channel to achieve high performance and maximum energy delivery. In designing the Mini-G system, we followed the successful approach used in developing the FFT device. This included shaping the electrodes and insulators to manage electric field enhancements, applying coatings to cathode surfaces to suppress electron field emission, introducing baffles to the power flow channel to block UV, and applying coatings to electrode surfaces to absorb UV. This paper describes the design of the Mini-G vacuum interface and power flow region, and results of modeling and simulations that were done to evaluate and optimize performance. Appropriate codes were used to examine electric field enhancements, magnetic insulation, flashover inhibition and UV ray tracing in the channel. In this paper, we also present results of laboratory testing on`and shapes, UV induced insulator flashover, along with measurements of HV thresholds for electron emission. We also report on UV reflectance data for some of the coatings considered. To date, there have been eight experiments performed using the Mini-G system. For the first two tests, the power flow channel had an extremely low vacuum inductance of 0.9 nH. On the second Mini-G test it appeared that a partial shorting occurred in the power flow channel, limiting full energy delivery to the load. The design was modified to reduce electrical stress, improve UV attenuation, and incorporate additional diagnostics. Th- s increased the inductance of the power flow channel to 1.5 nH. On the third Mini-G test the partial shorting reoccurred and the new diagnostics (inner Bdot probe) helped to identify the location at the vacuum insulator surface - about 10% of total current of 41 MA was diverted into the short. Further design modifications were incorporated to decrease electrical stress across the insulator and reduce UV illumination of the insulator surface. This increased the inductance of the power flow channel to 1.9 nH. On subsequent Mini-G experiments full current delivery to the load has been achieved with no occurrence of shorting.
Keywords :
inductance; load flow; pulse generators; pulsed power supplies; vacuum insulation; FFT device; HV vacuum insulator materials; LLNL; Mini-G explosive pulsed power system; Mini-G vacuum interface; UV induced insulator flashover; UV reflectance data; cathode surfaces; efficient current delivery; electric field enhancements; electrical stress; electron emission; electron field emission suppression; high-energy-density physics experiments; high-voltage gas-to-vacuum insulator; inductive loads; insulator surface; low-inductance vacuum power flow channel; two-stage helical-coaxial FCG; Cathodes; Coatings; Electric fields; Generators; Inductance; Insulators; Load flow; CMG; Computaional Codes; Explosively Driven Magnetic Flux Compression; FCG; Insulator; Power Flow; Test Stands; Vacuum; low inductance load;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetic Field Generation and Related Topics (MEGAGUSS), 2012 14th International Conference on Megagauss
Conference_Location :
Maui, HI
Print_ISBN :
978-1-4673-5719-7
Type :
conf
DOI :
10.1109/MEGAGAUSS.2012.6781424
Filename :
6781424
Link To Document :
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