Gas discharger generators of ultra-frequency a metal-bearing plasma to etching of piezoelectrics

Author

Orlikov, L.N. ; Orlikov, N.L. ; Shandarov, S.M.

Author_Institution

Dept. of Electron. Devices, State Univ. of Control Syst. & Radioelectron., Tomsk, Russia

fYear

1999

fDate

6/21/1905 12:00:00 AM

Abstract

The etching of lithium niobate in a high-voltage glow discharge with voltage of 10 KV is discussed. Pulsed supply of metal vapors into the etching chamber causes the discharge resignation and the generation of high frequency oscillations. An inductive-capacitate composition in a discharge circuit generates frequency 5 MHz. This helps to remove discharge from the piezoelectric surface and to increase the etching speed to 5 mcm/h

Keywords

lithium compounds; piezoelectric materials; plasma materials processing; sputter etching; 10 kV; 5 MHz; LiNbO₃; discharge circuit; discharge resignation; etching chamber; etching speed; gas discharger generators; high frequency oscillations; high-voltage glow discharge; inductive-capacitate composition; metal vapors; metal-bearing plasma etching; piezoelectric surface; piezoelectrics; pulsed supply; ultra-frequency; Etching; Frequency; Lithium niobate; Plasma applications; Plasma devices; Plasma temperature; Space charge; Surface discharges; Thermal stresses; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

High Power Microwave Electronics: Measurements, Identification, Applications, 1999. MIA-ME '99. Proceedings of the IEEE-Russia Conference

Conference_Location

Novosibirsk

Print_ISBN

5-7782-0270-9

Type

conf

DOI

10.1109/MIAME.1999.827841

Filename

827841