Title :
Sensing mechanisms of high temperature silicon carbide field-effect devices
Author :
Tobias, P. ; Golding, B. ; Ghosh, Ruby N.
Author_Institution :
Center for Sensor Mater., Michigan State Univ., East Lansing, MI, USA
Abstract :
Metal-insulator-silicon carbide devices have been used for gas sensing in automotive exhausts, because the large band gap of SiC allows high temperature operation up to 1200 K in chemically reactive environments. The sensor response to hydrogen containing species is due to two mechanisms whose effects are difficult to distinguish: the chemical modification of the barrier height at the metal-insulator interface and the creation/passivation of charged states at the insulator-silicon carbide interface. We describe an experimental technique combining in-situ photoemission and in-situ capacitance-voltage spectroscopy to separate the contribution of each phenomenon. Our experiment elucidates the sensing mechanism of high temperature SiC based gas sensors.
Keywords :
MIS devices; capacitance; chemical reactions; energy gap; gas sensors; passivation; photoemission; silicon compounds; wide band gap semiconductors; 1200 K; SiC; automotive exhausts; band gap; barrier height; capacitance-voltage spectra; chemically reactive environment; creation/passivation; gas sensor; metal-insulator interface; metal-insulator-silicon carbide devices; photoemission; sensing mechanisms; silicon carbide field-effect devices; Automotive engineering; Chemical sensors; Hydrogen; Insulation; Metal-insulator structures; Passivation; Photoelectricity; Photonic band gap; Silicon carbide; Temperature sensors;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1215342