Lithographic approach to pattern multiple nanoparticle thin films prepared by Layer-by-Layer self-assembly for microsystems

We report a lithographic approach to pattern multiple types of Layer-by-Layer self-assembled nanoparticle thin films. 150 nm and 64 nm polystyrene particles are separated in desired patterns with a feature size 5 to 20 microns. The process is quite simple, consisting of only two consecutive lift-offs, and there is no high requirement for the equipments. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method for complex microsystem fabrication which is composed mainly of functional nanoparticles for the applications to sensing and actuation in micro/nano scale.