• DocumentCode
    1700684
  • Title

    Photomask Manufacturing: An Example of Synchronized Ecosystem Learning

  • Author

    Berglund, C. Neil ; Weber, Charles M.

  • Author_Institution
    Portland State Univ., Portland
  • fYear
    2007
  • Firstpage
    2888
  • Lastpage
    2904
  • Abstract
    An empirical study of the productivity of manufacturing photomasks concludes that the uncontrolled growth of optical proximity effect correction and resolution enhancement techniques is driving up the cost of pattern generation and mask inspection to levels that threaten the profitability of photomask manufacturing. The marginal cost of production capacity, which is defined as the additional capacity required to produce one more mask per unit time is the driving metric.
  • Keywords
    integrated circuit manufacture; masks; photolithography; productivity; proximity effect (lithography); mask inspection; optical proximity effect correction; pattern generation; photomask manufacturing profitability; production capacity cost; resolution enhancement technique; synchronized ecosystem learning; Costs; Design for manufacture; Ecosystems; Inspection; Integrated circuit technology; Lithography; Manufacturing; Production; Profitability; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Management of Engineering and Technology, Portland International Center for
  • Conference_Location
    Portland, OR
  • Print_ISBN
    978-1-8908-4315-1
  • Electronic_ISBN
    978-1-8908-4315-1
  • Type

    conf

  • DOI
    10.1109/PICMET.2007.4349632
  • Filename
    4349632