DocumentCode
1700684
Title
Photomask Manufacturing: An Example of Synchronized Ecosystem Learning
Author
Berglund, C. Neil ; Weber, Charles M.
Author_Institution
Portland State Univ., Portland
fYear
2007
Firstpage
2888
Lastpage
2904
Abstract
An empirical study of the productivity of manufacturing photomasks concludes that the uncontrolled growth of optical proximity effect correction and resolution enhancement techniques is driving up the cost of pattern generation and mask inspection to levels that threaten the profitability of photomask manufacturing. The marginal cost of production capacity, which is defined as the additional capacity required to produce one more mask per unit time is the driving metric.
Keywords
integrated circuit manufacture; masks; photolithography; productivity; proximity effect (lithography); mask inspection; optical proximity effect correction; pattern generation; photomask manufacturing profitability; production capacity cost; resolution enhancement technique; synchronized ecosystem learning; Costs; Design for manufacture; Ecosystems; Inspection; Integrated circuit technology; Lithography; Manufacturing; Production; Profitability; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Management of Engineering and Technology, Portland International Center for
Conference_Location
Portland, OR
Print_ISBN
978-1-8908-4315-1
Electronic_ISBN
978-1-8908-4315-1
Type
conf
DOI
10.1109/PICMET.2007.4349632
Filename
4349632
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