Title :
90 MHz nanomechanical structures fabricated by stencil deposition and dry etching
Author :
Kim, G.M. ; ven den Boogaart, M.A.F. ; Kawai, S. ; Kawakatsu, H. ; Brugger, J.
Author_Institution :
Microsyst. Lab., Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Abstract :
We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured resonance frequency of a fabricated nanomechanical structure shows high resonance frequency up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of ultra-fast resonating elements in various materials.
Keywords :
chemical vapour deposition; light interferometry; micromachining; micromechanical devices; nanoelectronics; nanostructured materials; silicon compounds; sputter etching; 90 MHz; NEMS; SiN; dry etching; fabricating fast resonating; miniaturized shadow mask; nanomechanical elements; nanomechanical structures fabrication; stencil deposition; ultrafast resonating elements fabrication; Atomic force microscopy; Dry etching; Fabrication; Lithography; Nanoelectromechanical systems; Nanoscale devices; Nanostructures; Resonance; Resonant frequency; Silicon compounds;
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
DOI :
10.1109/SENSOR.2003.1215616
