• DocumentCode
    1701186
  • Title

    90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

  • Author

    Kim, G.M. ; ven den Boogaart, M.A.F. ; Kawai, S. ; Kawakatsu, H. ; Brugger, J.

  • Author_Institution
    Microsyst. Lab., Swiss Fed. Inst. of Technol., Lausanne, Switzerland
  • Volume
    1
  • fYear
    2003
  • Firstpage
    883
  • Abstract
    We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured resonance frequency of a fabricated nanomechanical structure shows high resonance frequency up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of ultra-fast resonating elements in various materials.
  • Keywords
    chemical vapour deposition; light interferometry; micromachining; micromechanical devices; nanoelectronics; nanostructured materials; silicon compounds; sputter etching; 90 MHz; NEMS; SiN; dry etching; fabricating fast resonating; miniaturized shadow mask; nanomechanical elements; nanomechanical structures fabrication; stencil deposition; ultrafast resonating elements fabrication; Atomic force microscopy; Dry etching; Fabrication; Lithography; Nanoelectromechanical systems; Nanoscale devices; Nanostructures; Resonance; Resonant frequency; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7731-1
  • Type

    conf

  • DOI
    10.1109/SENSOR.2003.1215616
  • Filename
    1215616