DocumentCode
1702863
Title
GEM-type detectors using LIGA and etchable glass technologies
Author
Ahn, S.K. ; Kim, J.G. ; Perez-Mendez, V. ; Chang, S. ; Jackson, K.H. ; Kadyk, J.A. ; Wenzel, W.A. ; Cho, G.
Author_Institution
Div. of Phys., Lawrence Berkeley Nat. Lab., CA, USA
Volume
1
fYear
2001
Firstpage
467
Abstract
Gas electron multipliers (GEMS) have been made by a deep X-ray lithography technique (LIGA process) using synchrotron radiation on polymethylmethacrylate (PMMA) and by UV processes using a UV etchable glass. Gain, stability and rate capability for these detectors are described. The LIGA detectors described consist of PMMA sheets of various thicknesses, 125 μm to 350 μm, and have 150 μm×150 μm square holes spaced with a pitch of 300 μm. Thin Cu electrodes are plated on the top and bottom surfaces using a Damascene method, followed by electroless plating of the copper onto a palladium-tin base layer. For various thicknesses of PMMA measurements have been made of absolute gain vs. voltage, time stability of gain, and rate capability. The operating gas mixture was usually Ar/CO2 (70/30) gas, but some tests were also done using P10 gas. We also made GEM-like detectors using the UV etchable glass called Foturan, patterned by exposure to UV light and subsequent etching. A few measurements using these detectors will be reported, including avalanche gain and time stability.
Keywords
LIGA; amplification; electrodes; electron multiplier detectors; etching; glass; 125 micron; 350 micron; Ar-CO2; Cu; Cu electrodes; Damascene method; Foturan; LIGA; P10 gas; PMMA; Pd; UV irradiation; avalanche gain; deep X-ray lithography; electroless plating; etchable glass; gain; gas electron multipliers; rate; stability; time stability; Copper; Detectors; Electrodes; Electron multipliers; Etching; Gain measurement; Glass; Stability; Synchrotron radiation; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Nuclear Science Symposium Conference Record, 2001 IEEE
ISSN
1082-3654
Print_ISBN
0-7803-7324-3
Type
conf
DOI
10.1109/NSSMIC.2001.1008500
Filename
1008500
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