DocumentCode
1703487
Title
Wide band-gap semiconductor: how good is diamond?
Author
Chalker, P.R.
Author_Institution
Surface Technol. Dept. of AEA Technol., Harwell Lab., Didcot, UK
fYear
1993
fDate
11/4/1993 12:00:00 AM
Firstpage
42370
Lastpage
42372
Abstract
The emergence of diamond thin film technology has provided the spur for research in to new applications of this material including tooling, optics, thermal management and electronics. As a semiconductor, diamond has some attractive properties and also some associated problems. The balance between these benefits and drawbacks will decide where the Electronic Engineer will employ diamond. The sophistication of silicon semiconductor technology in terms of wafer manufacture, device fabrication and system design will undoubtedly ensure its dominant use in microprocessors at the man-machine interface well into the next century. However, the growing research into wide band-gap semiconductors is suggesting that materials, other than silicon, will be exploited in peripheral applications at the machine-environment interface. In that context diamond might be an ideal semiconductor material for high power, igh frequency or high temperature applications
Keywords
CVD coatings; diamond; elemental semiconductors; semiconductor devices; semiconductor thin films; C; CVD deposition; device fabrication; diamond thin film technology; high frequency application; high power application; high temperature applications; machine-environment interface; man-machine interface; microprocessors; peripheral applications; system design; thermal management; wafer manufacture; wide band-gap semiconductors;
fLanguage
English
Publisher
iet
Conference_Titel
Diamond in Electronics and Optics, IEE Colloquium on
Conference_Location
London
Type
conf
Filename
280362
Link To Document