• DocumentCode
    1704697
  • Title

    Insights into wideband fractional All-Digital PLLs for RF applications

  • Author

    Temporiti, Enrico ; Weltin-Wu, Colin ; Baldi, Daniele ; Tonietto, Riccardo ; Svelto, Francesco

  • Author_Institution
    STMicroelectronics - Studio di Microelettronica, Pavia, Italy
  • fYear
    2009
  • Firstpage
    37
  • Lastpage
    44
  • Abstract
    Technology scaling and large-scale integration make the operating environment increasingly hostile for traditional analog design. In the area of frequency synthesis, All-Digital PLLs (ADPLLs) provide an attractive alternative to conventional PLLs: their wide programmability allows for multistandard application, and a digital intensive design means easy reconfigurability and shorter design cycles. However, wideband fractional ADPLLs come with a different set of problems, principally in-band spurious tones. Techniques to suppress spurious tones would eliminate a major obstacle for ADPLLs´ widespread proliferation into wireless RF applications. In this paper we first describe the evolution from the analog PLL to the divider-less ADPLL, of major interest for RF to date, then develop a model to predict location and level of spurs. Finally, we present a technique for spur reduction by means of digital calibration. Validation is performed through experiments on an ADPLL fabricated in 65 nm digital CMOS.
  • Keywords
    CMOS digital integrated circuits; phase locked loops; radiofrequency integrated circuits; RF applications; analog PLL evolution; digital CMOS; digital calibration; dividerless all digital PLL; large scale integration; size 0.65 nm; spur reduction technique; technology scaling; wideband fractional all digital PLL; Calibration; Frequency synthesizers; Large scale integration; Phase locked loops; Predictive models; Radio frequency; Semiconductor device modeling; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2009. CICC '09. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-4071-9
  • Electronic_ISBN
    978-1-4244-4073-3
  • Type

    conf

  • DOI
    10.1109/CICC.2009.5280921
  • Filename
    5280921