Review of ionized-PVD by hollow cathode magnetron sputtering

Summary form only given. The Hollow Cathode Magnetron (HCM) is a new type of high density plasma device developed for ionized physical vapor deposition (I-PVD). Unlike other I-PVD approaches where post-ionization of sputtered or evaporated metal atoms by either radiofrequency or microwave generated high density plasma is necessary, the HCM uses only a single DC power supply to both sputter and ionize the target material. A novel magnetic geometry provides the confining magnetic field to sustain a magnetron discharge within a cup-shaped hollow cathode and the means of ion extraction to allow the metal plasma to stream to the substrate.