• DocumentCode
    1708263
  • Title

    Test facility for high pressure plasmas

  • Author

    Block, R. ; Laroussi, Mounir ; Schoenbach, Karl H.

  • Author_Institution
    Phys. Electron. Res. Inst., Old Dominion Univ., Norfolk, VA, USA
  • fYear
    1999
  • Firstpage
    116
  • Abstract
    Summary form only given. High pressure nonthermal plasmas are gaining increasing importance because of their wide range of applications, e.g. in air plasma ramparts, gas processing, surface treatment, thin film deposition, and chemical and biological decontamination. In order to compare various methods of plasma generation with respect to efficiency, development of instabilities, homogeneity, lifetime etc., a central test facility for high pressure plasmas is being established. The facility will allow us to study large volume (>100 cm/sup 3/), nonthermal (gas temperature: <2000 K) plasmas over a large pressure range (10/sup -6/ Torr up to more than 1 atmosphere) in a standardized discharge cell. The setup was designed to generate plasmas in air as well as in gas mixtures. The available voltage range extends to 25 kV DC (10 kW power). The electrodes can be water cooled.
  • Keywords
    gas mixtures; plasma diagnostics; plasma instability; plasma pressure; plasma production; surface treatment; CCD video camera; IR interferometer; Stark broadening; air plasma ramparts; biological decontamination; chemical decontamination; electrical diagnostics; electron density measurement; four-channel oscilloscope; gas processing; high pressure nonthermal plasmas; homogeneity; instabilities; large volume nonthermal plasmas; lifetime; microwave interferometer; optical diagnostics; optical emission spectroscopy; plasma generation; rotational structure; rotational temperature; standardized discharge cell; surface treatment; test facility; thin film deposition; water cooled electrodes; weakly ionised plasma; Chemical processes; Decontamination; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Sputtering; Surface treatment; Temperature distribution; Test facilities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829327
  • Filename
    829327