DocumentCode
1708263
Title
Test facility for high pressure plasmas
Author
Block, R. ; Laroussi, Mounir ; Schoenbach, Karl H.
Author_Institution
Phys. Electron. Res. Inst., Old Dominion Univ., Norfolk, VA, USA
fYear
1999
Firstpage
116
Abstract
Summary form only given. High pressure nonthermal plasmas are gaining increasing importance because of their wide range of applications, e.g. in air plasma ramparts, gas processing, surface treatment, thin film deposition, and chemical and biological decontamination. In order to compare various methods of plasma generation with respect to efficiency, development of instabilities, homogeneity, lifetime etc., a central test facility for high pressure plasmas is being established. The facility will allow us to study large volume (>100 cm/sup 3/), nonthermal (gas temperature: <2000 K) plasmas over a large pressure range (10/sup -6/ Torr up to more than 1 atmosphere) in a standardized discharge cell. The setup was designed to generate plasmas in air as well as in gas mixtures. The available voltage range extends to 25 kV DC (10 kW power). The electrodes can be water cooled.
Keywords
gas mixtures; plasma diagnostics; plasma instability; plasma pressure; plasma production; surface treatment; CCD video camera; IR interferometer; Stark broadening; air plasma ramparts; biological decontamination; chemical decontamination; electrical diagnostics; electron density measurement; four-channel oscilloscope; gas processing; high pressure nonthermal plasmas; homogeneity; instabilities; large volume nonthermal plasmas; lifetime; microwave interferometer; optical diagnostics; optical emission spectroscopy; plasma generation; rotational structure; rotational temperature; standardized discharge cell; surface treatment; test facility; thin film deposition; water cooled electrodes; weakly ionised plasma; Chemical processes; Decontamination; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Sputtering; Surface treatment; Temperature distribution; Test facilities;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829327
Filename
829327
Link To Document