DocumentCode
1708404
Title
Sterilization by plasma active species at one atmosphere using a remote exposure reactor (RER)
Author
Sherman, D.M. ; Gadri, R.B. ; Karakaya, Fuat ; Che, Z. ; Montie, T.C. ; Kelly-Wintenberg, K. ; Tsai, P.P.Y. ; Roth ; Helfritch, D.J. ; Feldman, Paul
Author_Institution
Tennessee Univ., Knoxville, TN, USA
fYear
1999
Firstpage
119
Abstract
Summary form only given. At the UTK Plasma Sciences Laboratory we developed a remote exposure reactor (RER) based on the one atmosphere uniform glow discharge plasma OAUGDP which generates a plasma in an array of flat panels using air or other gases at one atmosphere. The RER convects the active species responsible for sterilization and increasing the surface energy of materials to a remote chamber in which the workpiece is located. This arrangement allows workpieces of any size or shape to be exposed to active species in the remote chamber, and does not make it necessary to expose them to the detrimental effects of being in direct contact with the plasma. The RER has closed return air recirculation, which convects active species at least once around the pneumatic loop, thus building up their concentration above that characteristic of a single pass of the active-species laden airflow past the workpiece. The active species of most relevance to sterilization and increasing surface energy appear to be atomic oxygen and possibly ozone. We have demonstrated the ability of the RER to increase the surface energy of workpieces in the remote exposure chamber, and to reduce the number of microorganisms on test samples by several powers of ten.
Keywords
glow discharges; microorganisms; plasma applications; O/sub 3/; active species; atomic O; closed return air recirculation; flat panels; microorganisms; one atmosphere uniform glow discharge plasma; ozone; plasma active species; plasma generation; pneumatic loop; remote exposure reactor; sterilization; surface energy; Atmosphere; Gases; Glow discharges; Inductors; Laboratories; Nuclear and plasma sciences; Plasma materials processing; Plasma properties; Shape; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829333
Filename
829333
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