Title :
Laser induced fluorescence study of NO/sub x/ in streamer discharges
Author :
Kharlov, A. ; Roth, G. ; Puchkarev, V. ; Gundersen, M.
Author_Institution :
Univ. of Southern California, Los Angeles, CA, USA
Abstract :
Summary form only given, as follows. A study of temporal and spatial dependence of NO and NO/sub 2/ in a transient plasma, using laser-induced fluorescence, is reported. Reactors including coaxial corona-type were studied under flowing conditions. The laser is used to study the processes occurring during the time of streamer formation and propagation, the decomposition of NO in close proximity to the streamer channel. The chemistry of NO and NO/sub 2/ in pure N/sub 2/, occurring several milliseconds following pulsed excitation was studied and spatially resolved concentration profiles were obtained. The initial simulations of chemical kinetics are also presented. Energy costs associated with single streamers for NO destruction are reported, and the role of streamers in generating plasma chemistry are discussed.
Keywords :
corona; discharges (electric); fluorescence; nitrogen compounds; photoluminescence; plasma chemistry; plasma diagnostics; plasma flow; reaction kinetics; N/sub 2/; NO; NO destruction; NO/sub 2/; NO/sub x/; chemical kinetics; chemistry; coaxial corona-type reactors; decomposition; energy costs; flowing conditions; initial simulations; laser induced fluorescence; laser-induced fluorescence; plasma chemistry; pulsed excitation; reactors; single streamers; spatial dependence; spatially resolved concentration profiles; streamer channel; streamer discharges; streamer formation; streamer propagation; streamers; temporal dependence; transient plasma; Chemical lasers; Coaxial components; Costs; Energy resolution; Fluorescence; Inductors; Kinetic theory; Optical propagation; Plasma chemistry; Spatial resolution;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829381