DocumentCode :
1710000
Title :
Discharge physics and chemistry of a novel atmospheric pressure plasma source
Author :
Park, Jongho ; Henins, I. ; Herrmann, H.W. ; Selwyn
Author_Institution :
Los Alamos Nat. Lab., NM, USA
fYear :
1999
Firstpage :
158
Abstract :
Summary form only given, as follows. The atmospheric pressure plasma jet (APPJ) is a unique plasma source operating at atmospheric pressure. The APPJ operates with RF power and produces a stable non-thermal discharge in capacitively-coupled configuration. The discharge is spatially and temporally homogeneous and provides a unique gas phase chemistry that is well suited for various applications including etching, film deposition, surface treatment and decontamination of chemical and biological warfare (CBW) agents. A theoretical model shows electron densities of 0.2-2/spl times/10/sup 11/ cm/sup -3/ for a helium discharge at a power level of 3-30 W cm/sup -3/. The APPJ also produces a large flux, equivalent of up to 10000 monolayer s/sup -1/, of chemically-active, atomic and metastable molecular species which can impinge surfaces several cm downstream of the confined source. In addition, the efforts are in progress to measure the electron density using microwave diagnostics and to benchmark the gas phase chemical model by using LIF and titration.
Keywords :
discharges (electric); electron density; plasma chemistry; plasma density; plasma deposition; plasma diagnostics; plasma jets; plasma materials processing; plasma production; sputter etching; surface treatment; 1 atm; 3 to 30 W; He discharge; LIF; RF power; atmospheric pressure plasma jet; atmospheric pressure plasma source; capacitively-coupled configuration; chemical and biological warfare agents; chemically-active species; decontamination; discharge chemistry; discharge physics; electron density; etching; film deposition; gas phase chemical model; gas phase chemistry; microwave diagnostics; nonthermal discharge; surface treatment; theoretical model; titration; Atmospheric-pressure plasmas; Chemicals; Electrons; Fault location; Physics; Plasma applications; Plasma chemistry; Plasma sources; Plasma stability; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829407
Filename :
829407
Link To Document :
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