DocumentCode :
1710347
Title :
A new test structure for interconnect capacitance monitoring
Author :
Nouet, Pascal ; Toulouse, Alain
Author_Institution :
Univ. des Sci. et Tech. du Languedoc, Montpellier, France
fYear :
1997
Firstpage :
81
Lastpage :
84
Abstract :
A new test structure for small capacitance measurement is proposed. Compared to previously presented test structures, the main advance concerns the DC output voltage that allows a more simple experimental set up. With such a test structure, the way is open for on-chip measurement of capacitances even for process monitoring. A validation test chip has been designed with test patterns dedicated to the accurate measurement of small interconnect capacitances
Keywords :
capacitance measurement; integrated circuit interconnections; integrated circuit testing; monitoring; DC output voltage; interconnect capacitance monitoring; interconnect capacitances; onchip measurement; process monitoring; small capacitance measurement; test structure; validation test chip; Capacitance measurement; Circuit testing; Conducting materials; Delay; Integrated circuit interconnections; Integrated circuit measurements; Monitoring; Parasitic capacitance; Semiconductor device measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1997. ICMTS 1997. Proceedings. IEEE International Conference on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-3243-1
Type :
conf
DOI :
10.1109/ICMTS.1997.589343
Filename :
589343
Link To Document :
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