Title :
Intrinsic resistivity nickel and gold thin film bolometers for pulsed X-ray measurements
Author :
McGurn, J. ; McKenney, J. ; Deeney, C. ; Coverdale, C.A. ; Spielman, R.B. ; Fehl, D. ; Ryan, Paul ; Chandler, G.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
Summary form only given, as follows. The accurate measurements of the emitted X-ray powers and yields from high-current Z pinches are essential in applying Z pinches to inertial fusion energy research, and to studying radiation-material interactions. On the 20-MA Z and the 10-MA Saturn accelerators, 1-/spl mu/m thick nickel and gold bolometers have been employed to measure the total yields and the 1 to 5 keV radiated X-rays from wire arrays and gas puff Z-pinch configurations. By careful deposition processes, these elements can be fabricated on pyrex substrates with resistivities that are near (within a few percent) of the intrinsic (bulk material) values. Moreover, oven calibrations have shown that the measured rate of change of resistivity with temperature also agrees with the bulk material value. Due to the quality of the thin film parameters, we have found good agreement between the bolometer calculated X-ray yields and those determined from calorimeters and diamond photoconductive detectors. In this paper, we will review the fabrication and calibration processes and we will discuss the comparison of bolometer measurements to other diagnostics.
Keywords :
X-ray applications; Z pinch; bolometers; plasma diagnostics; 1 to 5 keV; 10 MA; 20 MA; Au; Au thin film; Ni; Ni thin film; Saturn accelerators; calibration; diamond photoconductive detectors; emitted X-ray power; emitted X-ray yield; fabrication; gas puff Z-pinch configurations; high-current Z pinch; inertial fusion energy research; intrinsic resistivity thin film bolometers; pulsed X-ray measurements; pyrex substrates; radiated X-rays; radiation-material interactions; wire arrays; Bolometers; Calibration; Conductivity; Energy measurement; Gold; Nickel; Saturn; Thickness measurement; Transistors; Wire;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829434