DocumentCode :
1710685
Title :
Time evolution of ion energy distributions and optical emissions in pulsed radio frequency plasmas
Author :
Misakian, M. ; Benck, E. ; Wang, Yannan ; Olthoff, James ; Roberts, John
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear :
1999
Firstpage :
173
Abstract :
Summary form only given. Pulsed inductively coupled plasmas have recently received considerable attention because of their possible advantages over continuous plasma discharges in industrial applications. We report the results of time-resolved measurements of ion energy distributions, relative ion densities, as well as optical emissions and electrical characteristics in such plasmas for the simple gas mixture of argon and oxygen (50% Ar/50% O/sub 2/). Comparisons with pure argon are also presented. An inductively coupled version of the Gaseous Electronics Conference RF reference cell is used to produce the pulsed plasmas and the ions are sampled though a 10 /spl mu/m diameter hole in the center of a grounded plate electrode. Ions exiting through the hole are characterized with a 45/spl deg/ electrostatic energy analyzer connected in series with a quadrupole mass spectrometer. Optical emission measurements have been made at several different wavelengths to monitor the time evolution of excited species of argon and oxygen.
Keywords :
discharges (electric); mass spectra; plasma diagnostics; Ar; Ar-O/sub 2/; Ar-O/sub 2/ gas mixture; Gaseous Electronics Conference RF reference cell; O/sub 2/; electrical characteristics; electrostatic energy analyzer; excited species; grounded plate electrode; ion energy distributions; ion sampling; optical emission measurements; optical emissions; pulsed radio frequency plasmas; quadrupole mass spectrometer; relative ion densities; time evolution; time-resolved measurements; Argon; Density measurement; Energy measurement; Optical pulses; Particle beam optics; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829441
Filename :
829441
Link To Document :
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