Title :
Arc voltage behavior as indication of different operating modes in a plasma torch
Author :
Duan, Z. ; Wittmann, K. ; Heberlein, J. ; Coudert, J.F. ; Fauchais, P.
Author_Institution :
Minnesota Univ., Minneapolis, MN, USA
Abstract :
Summary form only given. An uncontrolled plasma instability is a phenomenon that most processes try to avoid. In plasma spraying, such an instability can lead to a deterioration of the coating quality. In our investigation, the voltage fluctuations of a subsonic DC plasma torch have been analyzed and correlated with appearance of plasma jet instabilities. The torch has a straight bore anode nozzle and a button shape cathode. The arc gas can be injected forming either a straight flow or a swirling flow. Three are operating modes have been found: the "restrike" mode which is characterized by a saw-tooth shape voltage waveform and a large fluctuating amplitude, the "take-over" mode which is represented with a more or less sinusoidal or triangle shape waveform with a varying amplitude, and the "steady" mode which shows a nearly flat voltage profile with a low mean voltage. In addition to the analysis of the voltage waveform, analysis of high speed video images obtained from end-on observation of the arc in the anode nozzle has been used as diagnostics.
Keywords :
arcs (electric); plasma arc spraying; plasma diagnostics; plasma instability; plasma jets; plasma torches; swirling flow; waveform analysis; anode nozzle; arc voltage behavior; button shape cathode; coating quality; high speed video images; large fluctuating amplitude; operating modes; plasma jet instabilities; plasma spraying; plasma torch; restrike mode; saw-tooth shape voltage waveform; sinusoidal shape waveform; steady mode; straight flow; subsonic DC plasma torch; swirling flow; take-over mode; triangle shape waveform; uncontrolled plasma instability; voltage fluctuations; voltage waveform; Anodes; Boring; Cathodes; Coatings; Image analysis; Low voltage; Plasma waves; Shape; Thermal spraying; Voltage fluctuations;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829477