A comparative study of remote plasma sources for environmentally-friendly CVD chambers cleaning

Author

Raoux, S. ; Lai, K.C. ; Nguyen, H. ; Sarfaty, M. ; Li, S.T. ; Davidow, J. ; Huang, T.F.

Author_Institution

Appl. Mater. Inc., Santa Clara, CA, USA

fYear

1999

Firstpage

196

Abstract

Summary form only given. In this study, we compare the characteristics of a microwave-driven and magnetically-enhanced inductively coupled NF/sub 3/ discharge. Optical emission spectroscopy, quadrupole mass spectroscopy, Fourier transform infrared and etch rate measurements were used to characterize the different sources and assess the environmental impact of the clean processes. A comparative analysis of the two types of plasma sources is made with respect to implementation of this cleaning technology in an industrial environment.

Keywords

Fourier transform spectra; infrared spectra; plasma CVD; plasma diagnostics; plasma production; Fourier transform infrared measurements; NF/sub 3/; cleaning technology; comparative analysis; environmentally-friendly CVD chambers cleaning; etch rate measurements; industrial environment; microwave-driven magnetically-enhanced inductively coupled NF/sub 3/ discharge; optical emission spectroscopy; quadrupole mass spectroscopy; remote plasma sources; Couplings; Etching; Fault location; Fourier transforms; Infrared spectra; Mass spectroscopy; Noise measurement; Plasma measurements; Plasma sources; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on

Conference_Location

Monterey, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-5224-6

Type

conf

DOI

10.1109/PLASMA.1999.829479

Filename

829479