• DocumentCode
    1711734
  • Title

    High frequency EMI filter parasitic characterization

  • Author

    Schutten, Michael ; Prabhakaran, Satish ; Karipides, David ; Nasadoski, Jeff ; Thomas, Robert

  • Author_Institution
    GE Global Res., Niskayuna, NY, USA
  • fYear
    2011
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    Design of electrical EMI filters requires an in-depth understanding of the desired frequency response. While low frequency filter performance (below 2-5 MHz) often matches the expected response, at higher frequencies the actual filter attenuation is generally much worse than expected. Traditional explanations involve the self parasitics of the reactive devices, equivalent series inductance (ESL) of capacitors, and equivalent parallel capacitance (EPC) of inductors. This paper demonstrates that the parasitic mutual coupling across successive filter stages plays an important role in degrading filter attenuation performance at high frequencies. An example filter is constructed, and it is shown that the performance is heavily influenced by the mutual inductance and mutual capacitance between the components. Techniques to measure these parasitic parameters are provided, as well as methods to reduce these parasitics and improve the filter attenuation. Circuit simulation results show excellent agreement with the measured filter performance, and demonstrate the filter degradation due to the self and mutual parasitics.
  • Keywords
    capacitors; circuit simulation; electromagnetic interference; filters; inductors; EMI filter parasitic characterization; capacitors equivalent series inductance; circuit simulation; electrical EMI filters; filter attenuation; frequency 2 MHz to 5 MHz; inductors equivalent parallel capacitance; mutual capacitance; mutual inductance; parasitic mutual coupling; reactive devices; Attenuation; Capacitance; Capacitors; Couplings; Inductance; Inductors; Power filters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vehicle Power and Propulsion Conference (VPPC), 2011 IEEE
  • Conference_Location
    Chicago, IL
  • ISSN
    Pending
  • Print_ISBN
    978-1-61284-248-6
  • Electronic_ISBN
    Pending
  • Type

    conf

  • DOI
    10.1109/VPPC.2011.6043242
  • Filename
    6043242