• DocumentCode
    1712
  • Title

    Improved trench MOS barrier Schottky rectifier by dielectric engineering

  • Author

    Ying, Wang ; Likun, Xu ; Kun, Ding

  • Author_Institution
    College of Information and Communication Engineering, Harbin Engineering University
  • Volume
    7
  • Issue
    2
  • fYear
    2014
  • fDate
    Feb-14
  • Firstpage
    325
  • Lastpage
    329
  • Abstract
    An improved trench MOS barrier Schottky (TMBS) rectifier by dielectric engineering variable K TMBS (VK-TMBS) is proposed and studied by two-dimensional numerical simulations. The device shows increasing forward current density and reduction in specific on-resistance (Rsp), as compared with a regular TMBS rectifier. VK-TMBS attains a breakdown voltage of 140 V, which is larger than that of the original TMBS. The forward voltage drop of TMBS is 0.64 V at 180 A/cm2 , and that of VK-TMBS is 0.59 V. The Rsp of VK-TMBS is 26.7% smaller than that of the TMBS. The numerical simulation results indicate that the proposed device features high performance with an improved figure of merit.
  • fLanguage
    English
  • Journal_Title
    Power Electronics, IET
  • Publisher
    iet
  • ISSN
    1755-4535
  • Type

    jour

  • DOI
    10.1049/iet-pel.2013.0173
  • Filename
    6747119