DocumentCode :
1712
Title :
Improved trench MOS barrier Schottky rectifier by dielectric engineering
Author :
Ying, Wang ; Likun, Xu ; Kun, Ding
Author_Institution :
College of Information and Communication Engineering, Harbin Engineering University
Volume :
7
Issue :
2
fYear :
2014
fDate :
Feb-14
Firstpage :
325
Lastpage :
329
Abstract :
An improved trench MOS barrier Schottky (TMBS) rectifier by dielectric engineering variable K TMBS (VK-TMBS) is proposed and studied by two-dimensional numerical simulations. The device shows increasing forward current density and reduction in specific on-resistance (Rsp), as compared with a regular TMBS rectifier. VK-TMBS attains a breakdown voltage of 140 V, which is larger than that of the original TMBS. The forward voltage drop of TMBS is 0.64 V at 180 A/cm2 , and that of VK-TMBS is 0.59 V. The Rsp of VK-TMBS is 26.7% smaller than that of the TMBS. The numerical simulation results indicate that the proposed device features high performance with an improved figure of merit.
fLanguage :
English
Journal_Title :
Power Electronics, IET
Publisher :
iet
ISSN :
1755-4535
Type :
jour
DOI :
10.1049/iet-pel.2013.0173
Filename :
6747119
Link To Document :
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