Title :
Trace hazardous metals detection with ant atmospheric microwave-generated plasma
Author :
Hadidi, Khayrollah ; Woskov, P. ; Green, Keith Evan ; Flores, G. ; Thomas, Paul
Author_Institution :
Plasma Fusion Center, MIT, Cambridge, MA, USA
Abstract :
Summary form only given. A 1.5 kW atmospheric microwave plasma at 2.45 GHz is being developed as an excitation source for real-time detection of hazardous metals in smokestack exhaust. There is currently an important need for metal continuous emissions monitors (CEMs) to meet current and future clean air regulations. A number of plasma generation methods for metal atomic emission spectroscopy are being tested for this application including inductively coupled plasmas (ICPs), laser sparks, DC electrode sparks, and microwave discharges. The microwave plasma has a significant advantage to continuously operate robustly in large volumes of fast flowing (/spl ges/14 1/minute) air or undiluted stack exhaust. Experimental measurements will be presented of the performance of this microwave plasma with Hg, Cd and As as a function of oxygen additive. An attempt will be made to explain the behavior in terms of the possible UV absorption and atomic excitation mechanisms in the plasma.
Keywords :
air pollution measurement; atomic emission spectroscopy; high-frequency discharges; plasma applications; plasma production; 1.5 kW; 2.45 GHz; As; Cd; DC electrode sparks; Hg; UV absorption; atmospheric microwave-generated plasma; atomic excitation mechanisms; clean air regulations; excitation source; fast flowing air; hazardous metals; inductively coupled plasmas; laser sparks; metal continuous emissions monitors; microwave discharges; oxygen additive; plasma generation methods; real-time detection; smokestack exhaust; trace hazardous metals detection; undiluted stack exhaust; Atomic beams; Atomic measurements; DC generators; Microwave generation; Plasma applications; Plasma measurements; Plasma sources; Smoke detectors; Sparks; Spectroscopy;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829519