• DocumentCode
    1712742
  • Title

    The effect of carbonaceous deposit for NO/sub x/ dissociation by barrier discharge

  • Author

    Fujiwara, Koji ; Itoyama, Katsutoshi ; Yanobe, T.

  • Author_Institution
    Fac. of Educ., Nagasaki Univ., Japan
  • fYear
    1999
  • Firstpage
    217
  • Abstract
    Summary form only given. A carbonaceous deposit was formed on the dielectric and the surface of electrodes, when the barrier discharge is generated in the mixed gas of CH/sub 4/ and N/sub 2/+NO. The authors have done this pre-treatment, changing the ratio of CH/sub 4/ and N/sub 2/+NO gases from 60 to 80%, under the condition of 500 to 700 Torr in pressure. After this pre-treatment was carried out, we introduced N/sub 2/+NO gas into the chamber. NO/sub x/ dissociation was done with 700 Torr of pressure in the chamber and 300 ml/min of flow rate. The authors investigated the effect of carbonaceous deposit and barrier discharge for NO/sub x/ dissociation. We measured mass spectra on NO/sub x/ by Q-mass. The dielectric is hard glass of 0.15 mm in thickness. The length of gap is 0.8 mm. An applied potential between electrodes was about 4,000 volts AC (peak value) and its frequency was 4.7 kHz.
  • Keywords
    dissociation; mass spectra; nitrogen compounds; plasma chemistry; plasma diagnostics; plasma-wall interactions; 4.7 kHz; 4000 V; 500 to 700 torr; N/sub 2/-NO; N/sub 2/-NO mixture; N/sub 2/O; NO; NO/sub 2/; NO/sub x/; NO/sub x/ dissociation; applied potential; barrier discharge; carbonaceous deposit; dielectric; electrode surface; flow rate; mass spectra; methane; mixed gas; pre-treatment; Argon; Dielectric measurements; Electrodes; Furnaces; Heating; Iron; Plasma materials processing; Plasma measurements; Plasma sources; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829521
  • Filename
    829521