DocumentCode
1713052
Title
Initial operation of a high power cusp gun
Author
Gallagher, D. ; Barsanti, M. ; Richards, J. ; Scafuri, F. ; Armstrong, C.
Author_Institution
Defensive Syst. Div., Northrop Grumman Corp., Rolling Meadows, IL, USA
fYear
1999
Firstpage
226
Abstract
Summary form only as given. A cusp gun, designed to generate an axis encircling beam with low velocity spread for high harmonic, high power (70 kV, 3.5 A) operation in gyrotrons and peniotrons, has been successfully fabricated and hot tested at reduced voltage, in a beam tester designed to measure beam perveance, size, thickness, velocity ratio (beam alpha), and later, beam ripple and velocity spread. The correct beam perveance was observed, and a relatively thin, round, hollow beam, with approximately the correct dimensions, was imaged on the Cerium glass witness plate. The data indicated, however, that there was substantial current intercepted on the anode and excessively high beam alpha measured through the capacitive probes. Maxwell magnetic field simulations and EGUN trajectory simulations showed these results to be consistent with a substantial fraction of the electrons incident on the glass probe generating reflecting secondaries and/or re-reflected primaries, which back-stream through the capacitive probes and then are intercepted at the anode.
Keywords
electron guns; particle beam diagnostics; 3.5 A; 70 kV; Ce glass witness plate; EGUN trajectory simulations; Maxwell magnetic field simulations; anode interception; axis encircling beam; back-stream; beam alpha; beam perveance; beam ripple; beam size; beam tester; beam thickness; beam velocity spread; capacitive probes; current interception; fabrication; glass probe; gyrotrons; high harmonic high power operation; high power cusp gun; hot test; initial operation; low velocity spread; peniotrons; re-reflected primaries; reflecting secondaries; thin round hollow beam; velocity ratio; Gyrotrons; Magnetic field measurement; Power generation; Power measurement; Power system harmonics; Probes; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829533
Filename
829533
Link To Document