DocumentCode
1713511
Title
Spectroscopic characterization of impurity ions on the Hawk POS
Author
Moschella, J.J. ; Klepper, C.C. ; Vidoli, C. ; Commisso, R.C. ; Black, D.C. ; Moosmann, B. ; Maron, Y.
Author_Institution
HY-Tech Res. Corp., Radford, VA, USA
fYear
1999
Firstpage
235
Abstract
Summary form only given. The intensities of several optical emission lines of C II, C III and C IV were measured on the Hawk plasma opening switch (PQS) in order to determine the role of contamination from plasma-surface interactions during the conduction phase. To operate the switch, the inverse pinch (IP) plasma source was used with hydrogen gas. This source injects a pure hydrogen plasma from inside the inner conductor (cathode) into the POS gap. Therefore, detection of carbon is direct evidence that impurities from material surfaces have been incorporated in to the switch plasma. In fact, previous experimental results with the IP suggested that impurities dominate the conduction scaling.
Keywords
plasma diagnostics; plasma impurities; plasma switches; plasma-wall interactions; C II; C III; C IV; C/sup +/; C/sup 2+/; C/sup 3+/; H/sub 2/ gas; Hawk plasma opening switch; conduction phase; conduction scaling; impurity ions; inverse pinch plasma source; optical emission lines; plasma-surface interactions; pure H plasma; Conducting materials; Hydrogen; Impurities; Optical switches; Particle beam optics; Plasma materials processing; Plasma measurements; Plasma sources; Spectroscopy; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829549
Filename
829549
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