• DocumentCode
    1713511
  • Title

    Spectroscopic characterization of impurity ions on the Hawk POS

  • Author

    Moschella, J.J. ; Klepper, C.C. ; Vidoli, C. ; Commisso, R.C. ; Black, D.C. ; Moosmann, B. ; Maron, Y.

  • Author_Institution
    HY-Tech Res. Corp., Radford, VA, USA
  • fYear
    1999
  • Firstpage
    235
  • Abstract
    Summary form only given. The intensities of several optical emission lines of C II, C III and C IV were measured on the Hawk plasma opening switch (PQS) in order to determine the role of contamination from plasma-surface interactions during the conduction phase. To operate the switch, the inverse pinch (IP) plasma source was used with hydrogen gas. This source injects a pure hydrogen plasma from inside the inner conductor (cathode) into the POS gap. Therefore, detection of carbon is direct evidence that impurities from material surfaces have been incorporated in to the switch plasma. In fact, previous experimental results with the IP suggested that impurities dominate the conduction scaling.
  • Keywords
    plasma diagnostics; plasma impurities; plasma switches; plasma-wall interactions; C II; C III; C IV; C/sup +/; C/sup 2+/; C/sup 3+/; H/sub 2/ gas; Hawk plasma opening switch; conduction phase; conduction scaling; impurity ions; inverse pinch plasma source; optical emission lines; plasma-surface interactions; pure H plasma; Conducting materials; Hydrogen; Impurities; Optical switches; Particle beam optics; Plasma materials processing; Plasma measurements; Plasma sources; Spectroscopy; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829549
  • Filename
    829549