DocumentCode :
1713511
Title :
Spectroscopic characterization of impurity ions on the Hawk POS
Author :
Moschella, J.J. ; Klepper, C.C. ; Vidoli, C. ; Commisso, R.C. ; Black, D.C. ; Moosmann, B. ; Maron, Y.
Author_Institution :
HY-Tech Res. Corp., Radford, VA, USA
fYear :
1999
Firstpage :
235
Abstract :
Summary form only given. The intensities of several optical emission lines of C II, C III and C IV were measured on the Hawk plasma opening switch (PQS) in order to determine the role of contamination from plasma-surface interactions during the conduction phase. To operate the switch, the inverse pinch (IP) plasma source was used with hydrogen gas. This source injects a pure hydrogen plasma from inside the inner conductor (cathode) into the POS gap. Therefore, detection of carbon is direct evidence that impurities from material surfaces have been incorporated in to the switch plasma. In fact, previous experimental results with the IP suggested that impurities dominate the conduction scaling.
Keywords :
plasma diagnostics; plasma impurities; plasma switches; plasma-wall interactions; C II; C III; C IV; C/sup +/; C/sup 2+/; C/sup 3+/; H/sub 2/ gas; Hawk plasma opening switch; conduction phase; conduction scaling; impurity ions; inverse pinch plasma source; optical emission lines; plasma-surface interactions; pure H plasma; Conducting materials; Hydrogen; Impurities; Optical switches; Particle beam optics; Plasma materials processing; Plasma measurements; Plasma sources; Spectroscopy; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829549
Filename :
829549
Link To Document :
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