Title :
Diagnostics and experiments on LAPPS
Author :
Leonhardt, D. ; Murphy, D.P. ; Walton, S.G. ; Meger, R.A. ; Fernsler, R.F. ; Pechacek, R.E.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
Abstract :
Summary form only given. NRL is developing a new plasma processing reactor called the ´Large Area Plasma Processing System´ with applications to semiconductor processing and other forms of surface modification. The system consists of a planar plasma distribution generated by a magnetically collimated sheet of 2-5 kV, 10 mA/cm/sup 2/ electrons injected into a neutral gas background. Temporally resolved measurements of the plasma sheet using Langmuir probes, spectrally resolved optical emission, microwave interferometry, and cyclotron harmonic microwave emission will be presented. Results of initial processing tests using an oxygen plasma showing isotropic ashing of a photoresist will be shown. Progress in the development of a DC hot filament cathode will be presented along with the status of the 1 m/sup 2/ UHV chamber for future processing tests.
Keywords :
Langmuir probes; electromagnetic wave interferometry; plasma diagnostics; plasma materials processing; semiconductor technology; surface treatment; 10 to 300 gauss; 2 to 5 kV; 20 to 200 mtorr; DC hot filament cathode; LAPPS; Langmuir probes; O plasma; UHV chamber; cyclotron harmonic microwave emission; diagnostics; electron injection; isotropic ashing; large area plasma processing system; magnetically collimated sheet; microwave interferometry; neutral gas background; photoresist; planar plasma distribution; plasma processing reactor; plasma sheet; semiconductor processing; spectrally resolved optical emission; surface modification; temporally resolved measurements; Electrons; Inductors; Magnetic semiconductors; Optical collimators; Optical interferometry; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma measurements; Testing;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829600
