Diagnostics and experiments on LAPPS

Author

Leonhardt, D. ; Murphy, D.P. ; Walton, S.G. ; Meger, R.A. ; Fernsler, R.F. ; Pechacek, R.E.

Author_Institution

Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA

fYear

1999

Firstpage

265

Abstract

Summary form only given. NRL is developing a new plasma processing reactor called the ´Large Area Plasma Processing System´ with applications to semiconductor processing and other forms of surface modification. The system consists of a planar plasma distribution generated by a magnetically collimated sheet of 2-5 kV, 10 mA/cm/sup 2/ electrons injected into a neutral gas background. Temporally resolved measurements of the plasma sheet using Langmuir probes, spectrally resolved optical emission, microwave interferometry, and cyclotron harmonic microwave emission will be presented. Results of initial processing tests using an oxygen plasma showing isotropic ashing of a photoresist will be shown. Progress in the development of a DC hot filament cathode will be presented along with the status of the 1 m/sup 2/ UHV chamber for future processing tests.

Keywords

Langmuir probes; electromagnetic wave interferometry; plasma diagnostics; plasma materials processing; semiconductor technology; surface treatment; 10 to 300 gauss; 2 to 5 kV; 20 to 200 mtorr; DC hot filament cathode; LAPPS; Langmuir probes; O plasma; UHV chamber; cyclotron harmonic microwave emission; diagnostics; electron injection; isotropic ashing; large area plasma processing system; magnetically collimated sheet; microwave interferometry; neutral gas background; photoresist; planar plasma distribution; plasma processing reactor; plasma sheet; semiconductor processing; spectrally resolved optical emission; surface modification; temporally resolved measurements; Electrons; Inductors; Magnetic semiconductors; Optical collimators; Optical interferometry; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma measurements; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on

Conference_Location

Monterey, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-5224-6

Type

conf

DOI

10.1109/PLASMA.1999.829600

Filename

829600