DocumentCode
1714808
Title
Discharge regimes and density jumps in a helicon plasma source
Author
Shinohara, Shoko ; Yonekura, Kenta
Author_Institution
Interdisciplinary Graduate Sch. of Eng. Sci., Kyushu Univ., Fukuoka, Japan
fYear
1999
Firstpage
266
Abstract
Summary form only given. A high density plasma source using a helicon wave is becoming very attractive in plasma processing and confinement devices. In the previous work (Shinohara, 1997, Shinohara et al., 1995, 1996 (2), 1997), the characteristics of this wave and plasma performance with diameters of 5 and 45 cm have been studied, and the helicon wave was only observed after the density jump. Recently, density jumps from the low to high electron densities with a level of 10/sup 13/ cm/sup -3/ were investigated by changing the antenna wavenumber spectrum (Shinohara et al., 1998), and the obtained results were compared with the inductively coupled plasma (ICP). However, the mechanisms of density jumps and plasma production are still open questions to be answered. Here, we try to investigate the discharge regimes and density jumps in a helicon plasma source, by changing the antenna wavenumber spectrum (two-loop antenna with the same or opposite current directions), At filling pressure (P=6 and 51 mTorr) and the external magnetic field (B/spl les/1 kG). The plasma was produced in a Pyrex tube with a diameter of 5 cm by RF with a frequency of 7 MHz.
Keywords
discharges (electric); helicons; plasma density; plasma production; 1 kG; 300 W; 51 mtorr; 6 mtorr; 7 MHz; Pyrex tube; RF frequency; antenna wavenumber spectrum; current directions; density jump mechanism; density jumps; discharge regimes; electron densities; external magnetic field; filling pressure; helicon plasma source; helicon wave; high density plasma source; inductively coupled plasma; plasma confinement devices; plasma performance; plasma processing; plasma production; tube diameter; two-loop antenna; Directive antennas; Electrons; Fault location; Plasma confinement; Plasma density; Plasma devices; Plasma materials processing; Plasma properties; Plasma sources; Plasma waves;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829603
Filename
829603
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