Title :
`Hibridas´ photoimageable thick film process and materials for microwave and sensor component applications
Author :
Muckett, Stephen ; Minalgene, Jurate
Author_Institution :
Mozaik Technol. Ventures Ltd., Ardington, UK
Abstract :
The `Hibridas´ photoimageable thick film process was originally developed by the Microelectronics department of the Research Institute for Radiomeasurement Engineering (now Hibridas Enterprise Ltd.) during the early 1980s. Using this process, it is possible to achieve thick film conductor line and space resolutions of 20 μm/30 μm at a fired film thickness of 10 μm on a standard alumina substrate. The Hibridas process equipment is described, and the performance of microwave devices and sensor components produced with Hibridas thick film materials are reported. The results show that photoimageable thick film technology may be of great interest to designers and producers of thick film circuits and components for applications where extremely fine line geometries and resolutions are required
Keywords :
electric sensing devices; hybrid integrated circuits; microwave integrated circuits; microwave materials; photolithography; thick film circuits; 10 micron; 20 micron; 30 micron; Al2O3; Hibridas photoimageable thick film materials; Hibridas photoimageable thick film process; Hibridas process equipment; Hibridas thick film materials; fine line geometries; fine line resolution; fired film thickness; microwave component applications; microwave devices; photoimageable thick film technology; sensor component applications; sensor components; standard alumina substrate; thick film circuits; thick film conductor line/space resolution; Conducting materials; Conductive films; Microelectronics; Microwave devices; Microwave sensors; Sensor phenomena and characterization; Substrates; Thick film circuits; Thick film sensors; Thick films;
Conference_Titel :
IEMT/IMC Symposium, 2nd 1998
Conference_Location :
Tokyo
Print_ISBN :
0-7803-5090-1
DOI :
10.1109/IEMTIM.1998.704546
