• DocumentCode
    171568
  • Title

    Recent progress in scaling InP HEMT TMIC technology to 850 GHz

  • Author

    Deal, W.R. ; Leong, Kevin ; Zamora, Alejandro ; Radisic, Vesna ; Mei, X.B.

  • Author_Institution
    Northrop Grumman Corp., Redondo Beach, CA, USA
  • fYear
    2014
  • fDate
    1-6 June 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this paper, recent work on pushing InP HEMT amplifier technology to 850 GHz is reported. In particular, we have demonstrated on-wafer gain at this frequency. To our knowledge, this is the first time gain has been reported at this frequency. This achievement is possible by transistor scaling, frontside and backside feature scaling and detailed transistor modeling and design.
  • Keywords
    III-V semiconductors; high electron mobility transistors; indium compounds; semiconductor device models; submillimetre wave transistors; HEMT TMIC technology; HEMT amplifier technology; InP; backside feature scaling; frequency 850 GHz; frontside feature scaling; terahertz monolithic integrated circuit; Abstracts; Indexes; Indium phosphide; mHEMTs; Terahertz; low noise amplifiers; power amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium (IMS), 2014 IEEE MTT-S International
  • Conference_Location
    Tampa, FL
  • Type

    conf

  • DOI
    10.1109/MWSYM.2014.6848588
  • Filename
    6848588