• DocumentCode
    1715983
  • Title

    Explosively formed fuses for high voltage systems

  • Author

    Tasker, D.G. ; Goforth, J.H. ; Fowler, C.M. ; Herrera, D.H. ; King, J.C. ; Lopez, E.A. ; Martinez, E.C. ; Oona, H. ; Marsh, S.P. ; Reinovsky, Robert E. ; Stokes, Jamie L. ; Tabaka, L.J. ; Torres, D.T. ; Sena, F.C. ; Kiutlu, G. ; Degnan, J.

  • Author_Institution
    California Univ., CA, USA
  • fYear
    1999
  • Firstpage
    291
  • Abstract
    Summary form only given. At Los Alamos, we had previously applied Explosively Formed Fuse (EFF) techniques to large systems, where the EFF has interrupted currents from 19 to 25 MA. More recently we have been investigating the use of the EFF technique to apply high voltages to high impedance loads in compact systems, and have used 43-cm EFF systems to interrupt currents of /spl sim/3 MA and produce voltages up to 300 kV. We now report our progress towards producing up to 500 kV, 1-/spl mu/s duration pulses using 76-cm EFF systems. In compact explosive systems, the interactions of shock and detonation waves with conductors and insulators offers some significant challenges, especially when the local electric fields approach the breakdown strengths of the insulators. The results of computer calculations and experiments of switch performance will be presented.
  • Keywords
    detonation waves; electric fuses; explosions; forming processes; high-voltage techniques; shock waves; 19 to 25 MA; 3 MA; 300 kV; 43 cm; 500 kV; Los Alamos; breakdown strengths; compact systems; computer calculations; conductors; current interruption; detonation wave effects; explosively formed fuses; high impedance loads; high voltage systems; insulators; local electric fields; pulse duration; shock wave interactions; switch performance; Conductors; Dielectrics and electrical insulation; Electric breakdown; Electric shock; Explosives; Fuses; Impedance; Laboratories; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829647
  • Filename
    829647