Dynamic properties of ultra-fast pulsed capillary discharge devices

Author

Krisch, I. ; Choi, P. ; Dumitrescu, C. ; Engel, A. ; Larour, J. ; Rous, J. ; Juschkin, L. ; Kunze, H.-J.

Author_Institution

Lab. de Phys. des Milieux Ionises, Ecole Polytech., Palaiseau, France

fYear

1999

Firstpage

302

Abstract

Summary form only given. We report on a fast pulsed capillary discharge device, which combines the features of transient hollow cathode discharge with the inherent characteristics of the capillary discharge to guarantee radiation in the VUV and soft X-ray region with ns rise time. Various combinations of discharge parameters differing in capacitance of the cell, in the aspect ratio and in the pressure of the filling gas have been studied in order to optimize this table top source to technical and scientific backlighting applications.

Keywords

X-ray lasers; X-ray production; discharges (electric); plasma devices; VUV radiation; aspect ratio; backlighting applications; capacitance; capillary discharge; discharge parameters; dynamic properties; fast pulsed capillary discharge device; filling gas; soft X-ray radiation; transient hollow cathode discharge; ultra-fast pulsed capillary discharge devices; Argon; Cathodes; Contracts; Fault location; Filling; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; X-rays;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on

Conference_Location

Monterey, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-5224-6

Type

conf

DOI

10.1109/PLASMA.1999.829669

Filename

829669