DocumentCode
1716563
Title
Simulations of the formation of strongly coupled plasmas using pulsed power
Author
Keinigs, R.K. ; Wood, B. ; Munson, Chase ; Trainor, R.J.
Author_Institution
Los Alamos Nat. Lab., NM, USA
fYear
1999
Firstpage
303
Abstract
Summary form only given. One experimental campaign planned for the pulse power facility, Atlas, will be devoted to the investigation of strongly-coupled plasma (SCP) effects on transport phenomena and equations-of-state in high-Z materials. Methods for forming strongly coupled plasmas using the pulsed-power facility, Atlas, are currently under investigation. For SCP experiments being planned, a metal plasma (/spl rho///spl rho//sup 0//spl sim/0.1, and T/spl sim/1-2 eV) imbedded in gas or foam (/spl rho//spl sim/.05 /spl rho//sub metal/, T/spl sim/0.5 eV) can produce initial values of /spl Gamma/ (coupling parameter) between 2-20. One approach to forming a plasma with the desired properties involves using an auxiliary capacitor bank to ohmically heat a thin metal shell to vaporization. The expansion of the plasma is impeded by the imbedding gas. Both one and two-dimensional magnetohydrodynamic models are being employed to characterize the plasma and determine the tamping conditions required for its confinement. Results for a titanium plasma, the confinement dynamics for this system, and values obtained for /spl Gamma/ will be presented. Means for experimentally diagnosing such plasmas will also be discussed.
Keywords
equations of state; plasma magnetohydrodynamics; plasma production; plasma simulation; plasma thermodynamics; plasma transport processes; pulsed power supplies; 0.5 eV; 1 to 2 eV; Atlas; Ti; Ti plasma; auxiliary capacitor bank; confinement dynamics; coupling parameter; equations-of-state; foam; gas; high-Z materials; magnetohydrodynamic models; metal plasma; ohmic heating; plasma expansion; pulse power facility; pulsed power; simulations; strongly coupled plasmas formation; strongly-coupled plasma effects; tamping conditions; thin metal shell; transport phenomena; vaporization; Capacitors; Equations; Impedance; Magnetic confinement; Plasma confinement; Plasma diagnostics; Plasma materials processing; Plasma properties; Plasma simulation; Plasma transport processes;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829672
Filename
829672
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