DocumentCode :
1716658
Title :
Fabrication of 3D nanowire frames by conventional micromachining technology
Author :
Sarajlic, E. ; Berenschot, E. ; Krijnen, G. ; Elwenspoek, Miko
Author_Institution :
MESA+ Res. Inst., Twente Univ., Enschede, Netherlands
Volume :
1
fYear :
2005
Firstpage :
27
Abstract :
We report on a simple parallel processing method capable of producing addressable three-dimensional (3D) nanometer-sized structures, such as wires, wire frames and dots. The method, which is fully compatible with standard micromachining, employs isotropic removal of conformally deposited material onto a prepared template, to form nanostructures in the concave corners of the template. The process results in well-defined nanometer scale structures with exact position and spatial arrangement fully determined by the template. An etching mask with nanometer size features and a nanowire pyramid on a freestanding cantilever have been successfully fabricated, demonstrating the feasibility and potential of this technology.
Keywords :
etching; micromachining; nanotechnology; nanowires; 3D nanowire frames; addressable three-dimensional nanometer-sized structures; concave corners; conformally deposited material; conventional micromachining technology; dots; etching mask; fabrication; freestanding cantilever; isotropic removal; nanostructures; parallel processing; prepared template; wire frames; Etching; Fabrication; Micromachining; Nanofabrication; Nanostructured materials; Nanostructures; Parallel processing; Silicon; Surface topography; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
Type :
conf
DOI :
10.1109/SENSOR.2005.1496350
Filename :
1496350
Link To Document :
بازگشت