Title :
X-ray and EUV diagnostics for the Nevada Terawatt Facility: plasma imaging, spectroscopy, and polarimetry
Author :
Kantsyrev, V.L. ; Bauer, B.S. ; Mancini, R.C. ; Shlyaptseva, A.S. ; Fdin, D.A. ; Golovkin, A. ; Hakel, P. ; Paraschiv, I. ; Ammons, N. ; Hansen, S.
Author_Institution :
Dept. of Phys., Nevada Univ., Reno, NV, USA
Abstract :
Summary form only given. A wide variety of advanced extreme ultraviolet (EUV) and X-ray diagnostics are being developed for the Nevada Terawatt Facility (NTF) at the University of Nevada, Reno. Time-resolved short-wavelength imaging, backlighting, imaging spectroscopy, and polarization spectroscopy will be employed to measure profiles of plasma temperature, density, flow, charge state, and magnetic field. The instruments are state-of-the-art applications of glass capillary converters (GCC), multilayer mirrors (MLM), and crystals. The devices include: a prototype of a new glass-capillary-based two-dimensional imaging spectrometer; a pinhole camera with 6 MCP imagers; a 5-channel crystal/MLM spectrometer ("Polychromator") with fast X-ray diodes and an added transmission grating spectrometer; a convex-crystal X-ray survey spectrometer; a prototype of an X-ray polarimeter/spectrometer; and a multiframe X-pinch backlighter yielding point-projection microscopy with few-micron, sub-ns resolution. Spectroscopic data will be interpreted with state-of-the-art spectral calculations that take into account line intensity, plasma broadening, opacity, and polarization effects, for both resonance and satellite lines. Emission spectroscopy will be used to measure plasma density and temperature in the hot plasma around exploding wires, with polarization measurements helping to determine the electron distribution function and the magnetic field in this region. The density and temperature of the high-density, low-temperature plasma inside exploding Al wires will be measured with absorption spectroscopy.
Keywords :
Z pinch; exploding wires; plasma density; plasma diagnostics; plasma flow; plasma temperature; polarimetry; 5-channel crystal/MLM spectrometer; Al wires; EUV diagnostics; MCP imagers; Nevada Terawatt Facility; X-ray diagnostics; X-ray polarimeter/spectrometer; absorption spectroscopy; added transmission grating spectrometer; backlighting; charge state; convex-crystal X-ray survey spectrometer; electron distribution function; emission spectroscopy; exploding wires; fast X-ray diodes; glass capillary converters; glass-capillary-based two-dimensional imaging spectrometer; high-density low-temperature plasma; hot plasma; imaging spectroscopy; line intensity; magnetic field; multiframe X-pinch backlighter; multilayer mirrors; opacity; pinhole camera; plasma broadening; plasma density; plasma flow; plasma imaging; plasma temperature; point-projection microscopy; polarimetry; polarization effects; polarization spectroscopy; polychromator; resonance lines; satellite lines; time-resolved short-wavelength imaging; Density measurement; Magnetic field measurement; Plasma density; Plasma diagnostics; Plasma measurements; Plasma temperature; Plasma x-ray sources; Spectroscopy; Ultraviolet sources; X-ray imaging;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829679