Title :
Metamorphic HEMT technology for low-noise applications
Author :
Leuther, A. ; Tessmann, A. ; Kallfass, I. ; Lösch, R. ; Seelmann-Eggebert, M. ; Wadefalk, N. ; Schäfer, F. ; Puyol, J. D Gallego ; Schlechtweg, M. ; Mikulla, M. ; Ambacher, O.
Author_Institution :
Fraunhofer Inst. for Appl. Solid-State Phys., IAF, Freiburg
Abstract :
Different noise sources in HEMTs are discussed, and state-of-the-art low-noise amplifiers based on the Fraunhofer IAF 100 nm and 50 nm gate length metamorphic HEMT (mHEMT) process are presented. These mHEMT technology feature an extrinsic fT of 220 / 375 GHz and an extrinsic transconduction gm, max of 1300 / 1800 mS/mm. By using the 50 nm technology several low-noise amplifier MMICs were realized. A small signal gain of 21 dB and a noise figure of 1.9 dB was measured in the frequency range between 80 and 100 GHz at ambient temperature. To investigate the low temperature behaviour of the 100 nm technology, single 4 * 40 mum mHEMTs were integrated in hybrid 4 - 8 GHz (Chalmers) and 16 - 26 GHz (Yebes) amplifiers. At cryogenic temperatures noise temperatures of 3 K at 5 GHz and 12 K at 22 GHz were achieved.
Keywords :
MMIC amplifiers; high electron mobility transistors; low noise amplifiers; Fraunhofer IAF; cryogenic temperatures noise temperatures; extrinsic transconduction; frequency 16 GHz to 26 GHz; frequency 4 GHz to 8 GHz; frequency 80 GHz to 100 GHz; gain 21 dB; gate length metamorphic HEMT process; low-noise amplifier MMIC; low-noise amplifiers; low-noise applications; metamorphic HEMT technology; noise figure; noise figure 1.9 dB; noise sources; size 50 nm; temperature 12 K; temperature 3 K; Frequency measurement; Gain measurement; HEMTs; Low-noise amplifiers; MMICs; MODFETs; Noise figure; Noise measurement; Temperature; mHEMTs;
Conference_Titel :
Indium Phosphide & Related Materials, 2009. IPRM '09. IEEE International Conference on
Conference_Location :
Newport Beach, CA
Print_ISBN :
978-1-4244-3432-9
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2009.5012475