Title :
Progress in the control of a "smart tube" high power backward wave oscillator
Author :
Park, G.T. ; Soualian, V.S. ; Abdaliah, C.T. ; Schmailoglu, E. ; Hegeler, Frank
Author_Institution :
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
Abstract :
Summary form only given. Previous results from our studies of the control of various parameters of an intense beam-driven relativistic backward wave oscillator (BWO) include maintaining a specified or desired output power over a determined frequency bandwidth, and maintaining a constant frequency over a wide range of power. This was accomplished using an iterative learning control (ILC) algorithm that yielded the appropriate input variables for the electron beam, as well as the appropriate displacement of the slow wave structure from the cutoff neck. A problem of much greater complexity is the simultaneous control of both frequency and power, involving the independent mapping of both power and frequency dependence on the two input variables: cathode voltage and slow wave structure displacement. The resultant two-variable system is implemented and tested for convergence with minimal iterations. The experimental results are presented, along with the theoretical background and hardware description.
Keywords :
backward wave oscillators; convergence of numerical methods; frequency control; iterative methods; microwave tubes; power control; relativistic electron beam tubes; slow wave structures; cathode voltage; convergence; cutoff neck; electron beam; frequency control; intense beam-driven relativistic backward wave oscillator; iterative learning control; minimal iterations; output power; power control; slow wave structure; slow wave structure displacement; smart tube; two-variable system; Bandwidth; Displacement control; Electric variables control; Electron beams; Frequency; Input variables; Iterative algorithms; Neck; Oscillators; Power generation;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829689