DocumentCode
1717150
Title
Photoluminescence characteristics of MOCVD grown-InAs quantum dots covered by GaInP layer
Author
Suzuki, Ryo ; Miyamoto, Takahiro ; Sengoku, T. ; Nemoto, Kae ; Tanabe, Shigeo ; Koyama, Fumio
Author_Institution
P.&I. Lab., Tokyo Inst. of Technol., Yokohama
fYear
2009
Firstpage
234
Lastpage
237
Abstract
PL characteristics of MOCVD-grown InAs QDs using a GaInP cover layer were investigated. It is confirmed that the strain modification effect of the cover layer regardless of growth methods is a cause of wavelength shift of QDs.
Keywords
III-V semiconductors; MOCVD coatings; gallium compounds; indium compounds; photoluminescence; semiconductor quantum dots; InAs-GaInP; MOCVD grown quantum dots; cover layer effect; photoluminescence characteristics; strain modification effect; wavelength shift; MOCVD; Photoluminescence; Quantum dots;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials, 2009. IPRM '09. IEEE International Conference on
Conference_Location
Newport Beach, CA
ISSN
1092-8669
Print_ISBN
978-1-4244-3432-9
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2009.5012491
Filename
5012491
Link To Document