Magnetic Field Analysis of Circular Plane Magnetron Sputtering Source

The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process. The distribution of transverse component of magnetic flux intensity on the surface of the target was calculated by means of the finite element method. Furthermore, the experiment distribution of the transverse component on the target surface was gained by practical measurement with Gauss instrument. The simulation results are consistent with the practical measurement results accurately with a good precision. These results will have important practical values in optimizing the design of magnetron sputtering target and improving the quality of thin films.