Title :
Plasma-ion beam treatment of Al for enhanced corrosion
Author :
Bystritskii, V.M. ; Yankelevich, Y.B. ; Kharlow, A.V. ; Garate, E. ; Grigoriev, V. ; Labernia, E. ; Dong, Xiaochun
Author_Institution :
California Univ., Irvine, CA, USA
Abstract :
Summary form only given. The micro-second Plasma Opening Switch (MPOS) provides an innovative approach for efficient generation (up to 50% and higher) of large area (10/sup 2/-10/sup 3/ cm/sup 2/) intense ion beams with variable and controlled density in the range of 10-10/sup 2/ A/cm/sup 2/, and energy of 10/sup 5-6/ eV. The paper describes the experimental device and results on the application of low voltage ion beams generated in MPOS for various metals surface modification with focus on Al alloys (Al 2014-24, Al 7075, Al-6061). At a charging voltage of 40 kV, the induced voltage, total MPOS stored current, and ion current amplitudes are 150-200 kV, 100-130 kA and 25 kA, respectively, with the ion current density varying in the range of 10-120 A/cm/sup 2/ along the inner cathode surface. Analysis of structural and electro-chemical properties of the MPOS treated Al samples are given, supported by computer simulation results on the solid/melted/gas phases transition dynamics in the upper layer.
Keywords :
aluminium alloys; corrosion; ion-surface impact; plasma applications; plasma devices; plasma switches; plasma-wall interactions; surface treatment; 100 to 130 kA; 150 to 200 kV; 25 kA; 40 kV; Al 2014-24; Al 6061; Al 7075; Al alloys; Al-Cu-Mg; Al-Mg-Si; Al-Zn-Mg; charging voltage; computer simulation; electro-chemical properties; enhanced corrosion; induced voltage; inner cathode surface; intense ion beams; ion current amplitudes; ion current density; low voltage ion beams; micro-second plasma opening switch; plasma-ion beam treatment; structural properties; transition dynamics; upper layer; Aluminum alloys; Cathodes; Corrosion; Current density; Ion beams; Low voltage; Particle beams; Plasma density; Surface charging; Switches;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604361
