DocumentCode :
1717712
Title :
InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors with high current gain and low base sheet resistance
Author :
Chen, Shu-Han ; Chang, Chao-Min ; Chiang, Pei-Yi ; Wang, Sheng-Yu ; Chyi, Jen-Inn
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Jhongli
fYear :
2009
Firstpage :
319
Lastpage :
322
Abstract :
The proposed InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors (DHBTs) exhibit a rather high current gain despite the use of a highly doped and thick InGaAsSb base layer, indicating that a high minority carrier lifetime exists in the InGaAsSb material. A high current gain over sheet resistance ratio, low cross-over current and a wide constant current gain range have been achieved, suggesting that the novel InAlAs/InGaAsSb/InGaAs DHBTs are grown with a high quality InGaAsSb base layer.
Keywords :
III-V semiconductors; aluminium compounds; carrier lifetime; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; InAlAs-InGaAsSb-InGaAs; double heterojunction bipolar transistors; high current gain; low base sheet resistance; minority carrier lifetime; Composite materials; Doping; Double heterojunction bipolar transistors; Electrons; Indium compounds; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Optical scattering; Sheet materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2009. IPRM '09. IEEE International Conference on
Conference_Location :
Newport Beach, CA
ISSN :
1092-8669
Print_ISBN :
978-1-4244-3432-9
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2009.5012505
Filename :
5012505
Link To Document :
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