High aspect ratio nano-structures (HARNS) for photonic MEMS based on vertical DBR architecture

Author

Marty, Frederic ; Saadany, Bassam ; Bourouina, Tarik ; Mita, Yoshio ; Shibata, Tadashi

Author_Institution

ESYCOM, Ecole Superieure d´´Ingenieurs en Electronique et Electrotechnique, Noisy-Le-Grand, France

Volume

1

fYear

2005

Firstpage

384

Abstract

High aspect ratio nano-structures (HARNS), having an aspect ratio of up to 107, were fabricated by DRIE (deep reactive ion etching). Sidewall surface roughness was reduced to a level less than 20 nm peak-to-valley. These technological advances are applied to photonic MEMS based on in-plane, free-space propagation of light. As an illustration, a Fabry-Perot cavity is presented. It uses vertical distributed Bragg reflectors (DBRs), which consist of thin silicon walls separated by small air gaps, the widths being an even multiple of quarter wavelengths of light in silicon and in air, respectively.

Keywords

distributed Bragg reflectors; micro-optics; micromachining; micromechanical devices; nanotechnology; sputter etching; DRIE; Fabry-Perot cavity; Si; air gaps; deep reactive ion etching; high aspect ratio nanostructures; in-plane free-space light propagation; in-plane light propagation; photonic MEMS; sidewall surface roughness; thin silicon walls; vertical DBR architecture; vertical distributed Bragg reflectors; Air gaps; Distributed Bragg reflectors; Etching; Fabry-Perot; Micromechanical devices; Optical propagation; Photonics; Rough surfaces; Silicon; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on

Print_ISBN

0-7803-8994-8

Type

conf

DOI

10.1109/SENSOR.2005.1496436

Filename

1496436