DocumentCode :
1721065
Title :
Microelectronics process engineering program at SJSU
Author :
Parent, David ; Dessouky, Yasser ; Gleixner, Stacy ; Young, Gregory ; Allen, Emily
Author_Institution :
Coll. of Eng., San Jose State Univ., CA, USA
fYear :
2001
fDate :
6/23/1905 12:00:00 AM
Firstpage :
128
Lastpage :
134
Abstract :
At present, there is a need for engineers with CMOS processing knowledge, statistical process control (SPC) skills, and the ability to work in an interdisciplinary team environment and assume leadership roles. San Jose State University are developing an interdisciplinary lab-based microelectronics process engineering program that introduces SPC and DOE to students in a microelectronics manufacturing environment. At the heart of the program are three courses, each of which is imagined to be a division of a fictitious semiconductor fabrication company (Spartan Semiconductor Services, Inc., or S3i). The divisions are: Digital NMOS division (MatE/EE129: Introduction to IC Fabrication), Thin Film Research Division (MatE/ChE 166: Advanced Thin Film Processes) and CMOS Division and SPC task force (MatE/EE 167: Microelectronics Manufacturing Methods). Several unique features of the program are its introduction of SPC in a microelectronics manufacturing environment, the inclusion of design of experiments (DOE) topics, and the faculty-faculty, faculty-student and student-student interaction among the three courses (divisions). Ultimately, we are trying to provide a learning environment that will allow our students to be immediately productive in an IC production facility, to be able to communicate with IC process engineers, and to be prepared for graduate school programs
Keywords :
CMOS integrated circuits; design of experiments; electronic engineering education; integrated circuit manufacture; integrated circuit technology; statistical process control; student experiments; CMOS; CMOS processing knowledge; DOE; IC fabrication; IC process engineers; IC production facility; SJSU; SPC; SPC skills; SPC task force; San Jose State University; design of experiments; digital NMOS; faculty-faculty interaction; faculty-student interaction; graduate school programs; interdisciplinary lab-based microelectronics process engineering program; interdisciplinary team environment; leadership roles; microelectronics manufacturing environment; microelectronics manufacturing methods; microelectronics process engineering program; semiconductor fabrication company; statistical process control; student-student interaction; thin film processes; thin film research; CMOS process; Fabrication; Heart; Knowledge engineering; Manufacturing processes; Microelectronics; Process control; Semiconductor device manufacture; Semiconductor thin films; US Department of Energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 2001. Proceedings of the Fourteenth Biennial
Conference_Location :
Richmond, VA
ISSN :
0749-6877
Print_ISBN :
0-7803-6691-3
Type :
conf
DOI :
10.1109/UGIM.2001.960313
Filename :
960313
Link To Document :
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