DocumentCode :
1721403
Title :
Modeling a network of MEMS fabrication sites
Author :
Benard, William L. ; Huff, Michael A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
2001
fDate :
6/23/1905 12:00:00 AM
Firstpage :
171
Lastpage :
178
Abstract :
The MEMS Exchange is a network of MEMS fabrication facilities, wherein wafers are allowed to be processed at multiple sites to provide customers with access to an extremely diverse set of processing capabilities in a very flexible manner. This framework for fabrication of MEMS devices is an instance of a new manufacturing paradigm, which is capable of delivering mass product customization. In two and half years of operation, the MEMS Exchange has completed over 160 custom runs. Data is captured as part of the course of routine MEMS Exchange operations. This data forms the foundation for the models being developed for due date estimation and system capacity management. A discrete event simulation has been written to model fab behavior for varying load and staff availability. This simulator is being used to establish an optimal scheduling algorithm for the manufacturing nodes in order to maximize the network throughput
Keywords :
discrete event simulation; flexible manufacturing systems; manufacturing resources planning; micromachining; micromechanical devices; production control; semiconductor process modelling; MEMS Exchange; MEMS Exchange operations; MEMS device fabrication framework; MEMS fabrication facilities; MEMS fabrication site network modeling; data capture; discrete event simulation; due date estimation; fab behavior modeling; manufacturing nodes; manufacturing paradigm; mass product customization; multiple sites; network throughput; optimal scheduling algorithm; processing capabilities; staff availability; system capacity management; wafer processing; Discrete event simulation; Fabrication; Microelectromechanical devices; Micromechanical devices; Optimal scheduling; Product customization; Scheduling algorithm; Semiconductor device modeling; Throughput; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 2001. Proceedings of the Fourteenth Biennial
Conference_Location :
Richmond, VA
ISSN :
0749-6877
Print_ISBN :
0-7803-6691-3
Type :
conf
DOI :
10.1109/UGIM.2001.960324
Filename :
960324
Link To Document :
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