• DocumentCode
    1721563
  • Title

    Two-dimensional drain engineering for leakage reduction in thin-film transistors

  • Author

    King, Tsu-Jae ; Hack, Michael

  • Author_Institution
    Xerox Palo Alto Research Center
  • fYear
    1994
  • fDate
    6/16/1905 12:00:00 AM
  • Firstpage
    47
  • Lastpage
    48
  • Keywords
    Computer hacking; Current measurement; Doping profiles; Leakage current; Measurement standards; Resilience; Statistical distributions; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 1994. 52nd Annual
  • Type

    conf

  • DOI
    10.1109/DRC.1994.1009410
  • Filename
    1009410
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1721563