• DocumentCode
    1722570
  • Title

    Single crystalline silicon micromirror array for peptide synthesis applications

  • Author

    Jang, Yun-Ho ; Lee, Kook-Nyung ; Shin, Dong-Sik ; Lee, Yoon-Sik ; Kim, Yong-Kweon

  • Author_Institution
    Samsung Electron. Co., Ltd., South Korea
  • Volume
    1
  • fYear
    2005
  • Firstpage
    996
  • Abstract
    A single crystalline silicon (SCS) micromirror array (MMA) using a silicon-on-insulator (SOI) wafer and stepper photolithography was developed firstly for peptide synthesis applications. A large mirror size (210 μm) and a separation (60 μm) were optimized for the peptide synthesis application. Smooth surface (RMS roughness <4 nm), flat mirror plate (curvature radius >0.3 m), and uniform voltage characteristics among 256 mirrors (only 2.12 V standard deviation for the average of 96.99 V) were obtained thanks to the SCS and the stepper. Peptide spacers were synthesized with different lengths using the fabricated MMA that was installed in an automatic peptide synthesis system, confirming that the fabricated SCS MMA is a useful tool in peptide synthesis.
  • Keywords
    micromachining; micromirrors; optimisation; organic compounds; photolithography; silicon; silicon-on-insulator; 210 micron; 60 micron; 96.99 V; SOI wafer; mirror separation optimization; mirror size optimization; peptide spacers; peptide synthesis; silicon-on-insulator wafer; single crystalline silicon micromirror array; stepper photolithography; surface roughness; uniform voltage characteristics; Aluminum; Crystallization; Electrodes; Lithography; Micromirrors; Mirrors; Peptides; Silicon on insulator technology; Springs; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
  • Print_ISBN
    0-7803-8994-8
  • Type

    conf

  • DOI
    10.1109/SENSOR.2005.1496623
  • Filename
    1496623