DocumentCode
1722570
Title
Single crystalline silicon micromirror array for peptide synthesis applications
Author
Jang, Yun-Ho ; Lee, Kook-Nyung ; Shin, Dong-Sik ; Lee, Yoon-Sik ; Kim, Yong-Kweon
Author_Institution
Samsung Electron. Co., Ltd., South Korea
Volume
1
fYear
2005
Firstpage
996
Abstract
A single crystalline silicon (SCS) micromirror array (MMA) using a silicon-on-insulator (SOI) wafer and stepper photolithography was developed firstly for peptide synthesis applications. A large mirror size (210 μm) and a separation (60 μm) were optimized for the peptide synthesis application. Smooth surface (RMS roughness <4 nm), flat mirror plate (curvature radius >0.3 m), and uniform voltage characteristics among 256 mirrors (only 2.12 V standard deviation for the average of 96.99 V) were obtained thanks to the SCS and the stepper. Peptide spacers were synthesized with different lengths using the fabricated MMA that was installed in an automatic peptide synthesis system, confirming that the fabricated SCS MMA is a useful tool in peptide synthesis.
Keywords
micromachining; micromirrors; optimisation; organic compounds; photolithography; silicon; silicon-on-insulator; 210 micron; 60 micron; 96.99 V; SOI wafer; mirror separation optimization; mirror size optimization; peptide spacers; peptide synthesis; silicon-on-insulator wafer; single crystalline silicon micromirror array; stepper photolithography; surface roughness; uniform voltage characteristics; Aluminum; Crystallization; Electrodes; Lithography; Micromirrors; Mirrors; Peptides; Silicon on insulator technology; Springs; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN
0-7803-8994-8
Type
conf
DOI
10.1109/SENSOR.2005.1496623
Filename
1496623
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