Title :
Dielectric and breakdown studies on Nd2O3 and NdF3 thin films
Author :
Narayandass, Sa K. ; Kannan, M.D. ; Balasubramanian, C. ; Mangalaraj, D.
Author_Institution :
Dept. of Phys., Bharathiar Univ., Coimbatore, India
Abstract :
The authors have systematically investigated the dielectric and breakdown characteristics of vacuum-deposited Nd2O3 and NdF3 thin films over a wide range of frequency and temperature. From the loss characteristics the relaxation effect observed in NdF3 films is attributed to a dielectric relaxation phenomenon arising from the dipolar orientation. The relaxation times for the two types of dipole relaxation, at 423 K, are 3.987×10-8 s and 7.24×10-6 s, respectively. The dipole moment, dipole strength, and dipole concentration have been estimated as 1.071×10-27 cm, 2.34×104, and 3.01×1027 m-3, respectively. The dependence of thickness and temperature on the breakdown field follows the Forlani-Minnja electron avalanche theory
Keywords :
dielectric losses; dielectric relaxation; dielectric thin films; electric breakdown of solids; neodymium compounds; vacuum deposited coatings; 1 kHz to 10 MHz; 1.33 Pa; 77 to 483 K; Cole-Cole plot; Forlani-Minnja electron avalanche theory; Nd2O3; NdF3; breakdown characteristics; dielectric relaxation phenomenon; dipolar orientation; dipole concentration; dipole moment; dipole strength; loss characteristics; loss tangent; series capacitance; thickness dependence; thin films; vacuum-deposited; Avalanche breakdown; Dielectric breakdown; Dielectric losses; Dielectric thin films; Frequency; Neodymium; Temperature dependence; Temperature distribution; Vacuum breakdown; Vacuum systems;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1992. Annual Report. Conference on
Conference_Location :
Victoria, BC
Print_ISBN :
0-7803-0565-5
DOI :
10.1109/CEIDP.1992.283157
